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BS EN 62047-16:2015 | British Standards

Standards Shop | ICS 31 | ICS 31.080 |  ICS 31.080.99

31.080.99 Other semiconductor devices

Semiconductor devices. Micro-electromechanical devices Test methods for determining residual stresses of MEMS films. Wafer curvature and cantilever beam deflection methods

Semiconductor devices. Micro-electromechanical devices Test methods for determining residual stresses of MEMS films. Wafer curvature and cantilever beam deflection methods

BS EN 62047-16:2015

Semiconductor devices. Micro-electromechanical devices Test methods for determining residual stresses of MEMS films. Wafer curvature and cantilever beam deflection methods


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ISBN: 9780580780806

Keywords:
Integrated circuits, Electronic equipment and components, Vocabulary, Terminology, Semiconductor technology, Semiconductor devices, Electromechanical devices, PDF
Publication Date31 Jul 2015
Product SKU30259234
ISBN9780580780806
BSI CodeBS EN 62047-16:2015
No. of pages18
PublisherBritish Standards Institution
Identical National Standard to:
  • EN 62047-16:2015
  • IEC 62047-16:2015




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